Abstract: In this paper,by means of DMD(digital micro-mirror device) for digital imaging lithography mask,with the chromium coating glass as the substrate,binary optical mask on it is made.CAD computer graphics file designed is output in BMP file format and then imported to the digital mask imaging system based on DMD.Through exposure,development,fixing,etching and the glue wiping-off,the required mask is obtained.This mask can be used for reduction projecting system and get a much smaller pattern on a wafer than on the mask so as to achieve the requirements of higher resolution.